apl. Prof. Dr.-Ing. Dipl.-Phys. Kirsten Weide-Zaage

apl. Prof. Dr.-Ing. Dipl.-Phys. Kirsten Weide-Zaage
Adresse
Appelstr. 4
30167 Hannover
Gebäude
Raum
220
Adresse
Appelstr. 4
30167 Hannover
Gebäude
Raum
220
  • Publikationsliste

    Zeige Ergebnisse 61 - 80 von 104

    2012


    Influence of the barrier properties on the mechanical stress and migration distribution in a copper metallization. / Kludt, Jörg; Ciptokusumo, J.; Weide-Zaage, K.
    2012 13th International Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Microsystems, EuroSimE 2012. 2012. 6191701 (2012 13th International Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Microsystems, EuroSimE 2012).

    Publikation: Beitrag in Buch/Bericht/Sammelwerk/KonferenzbandAufsatz in KonferenzbandForschungPeer-Review

    Simulation of the influence of TiAl 3 layers on the thermal-electrical and mechanical behaviour of Al metallizations. / Kludt, J.; Weide-Zaage, K.; Ackermann, M. et al.
    in: Microelectronics reliability, Jahrgang 52, Nr. 9-10, 09.2012, S. 1987-1992.

    Publikation: Beitrag in FachzeitschriftArtikelForschungPeer-Review

    Electro- and thermo-migration induced failure mechanisms in Package on Package. / Meinshausen, L.; Weide-Zaage, K.; Frémont, H.
    in: Microelectronics reliability, Jahrgang 52, Nr. 12, 12.2012, S. 2889-2906.

    Publikation: Beitrag in FachzeitschriftÜbersichtsarbeitForschungPeer-Review

    Migration induced IMC formation in SAC305 solder joints on Cu, NiAu and NiP metal layers. / Meinshausen, L.; Frémont, H.; Weide-Zaage, K.
    in: Microelectronics reliability, Jahrgang 52, Nr. 9-10, 09.2012, S. 1827-1832.

    Publikation: Beitrag in FachzeitschriftArtikelForschungPeer-Review

    Thermal management for stackable packages with stacked ICs. / Meinshausen, L.; Weide-Zaage, K.; Frémont, H.
    2012 13th International Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Microsystems, EuroSimE 2012. 2012. 6191700 (2012 13th International Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Microsystems, EuroSimE 2012).

    Publikation: Beitrag in Buch/Bericht/Sammelwerk/KonferenzbandAufsatz in KonferenzbandForschungPeer-Review


    2011


    Influence of air gaps on the thermal-electrical-mechanical behavior of a copper metallization. / Bauer, Irina; Weide-Zaage, Kirsten; Meinshausen, Lutz.
    in: Microelectronics reliability, Jahrgang 51, Nr. 9-11, 09.2011, S. 1587-1591.

    Publikation: Beitrag in FachzeitschriftArtikelForschungPeer-Review

    Electro- and thermomigration in micro bump interconnects for 3D integration. / Meinshausen, L.; Weide-Zaage, K.; Petzold, M.
    2011 IEEE 61st Electronic Components and Technology Conference, ECTC 2011. 2011. S. 1444-1451 5898701 (Proceedings - Electronic Components and Technology Conference).

    Publikation: Beitrag in Buch/Bericht/Sammelwerk/KonferenzbandAufsatz in KonferenzbandForschungPeer-Review

    Migration induced material transport in Cu-Sn IMC and SnAgCu microbumps. / Meinshausen, L.; Weide-Zaage, K.; Frémont, H.
    in: Microelectronics reliability, Jahrgang 51, Nr. 9-11, 09.2011, S. 1860-1864.

    Publikation: Beitrag in FachzeitschriftArtikelForschungPeer-Review


    2010


    Mechanical characterization of copper based metallizations with different via-bottom geometries. / Ciptokusumo, Johar; Weide-Zaage, Kirsten; Aubel, Oliver.
    IPFA 2010 - 17th International Symposium on the Physical and Failure Analysis of Integrated Circuits. 2010. 5532227 (Proceedings of the International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA).

    Publikation: Beitrag in Buch/Bericht/Sammelwerk/KonferenzbandAufsatz in KonferenzbandForschungPeer-Review

    Principles for simulation of barrier cracking due to high stress. / Ciptokusumo, Johar; Weide-Zaage, Kirsten; Aubel, Oliver.
    2010 11th International Conference on Thermal, Mechanical and Multi-Physics Simulation, and Experiments in Microelectronics and Microsystems, EuroSimE 2010. 2010. 5464617 (2010 11th International Conference on Thermal, Mechanical and Multi-Physics Simulation, and Experiments in Microelectronics and Microsystems, EuroSimE 2010).

    Publikation: Beitrag in Buch/Bericht/Sammelwerk/KonferenzbandAufsatz in KonferenzbandForschungPeer-Review

    PoP prototyping by determination of matter transport effects. / Meinshausen, L.; Weide-Zaage, K.; Feng, W. et al.
    2010 IEEE CPMT Symposium Japan, ICSJ10. 2010. 5679664 (2010 IEEE CPMT Symposium Japan, ICSJ10).

    Publikation: Beitrag in Buch/Bericht/Sammelwerk/KonferenzbandAufsatz in KonferenzbandForschungPeer-Review

    Underfill and mold compound influence on PoP aging under high current and high temperature stress. / Meinshausen, L.; Weide-Zaage, K.; Frémont, H.
    Electronics System Integration Technology Conference, ESTC 2010 - Proceedings. 2010. 5642803 (Electronics System Integration Technology Conference, ESTC 2010 - Proceedings).

    Publikation: Beitrag in Buch/Bericht/Sammelwerk/KonferenzbandAufsatz in KonferenzbandForschungPeer-Review

    Virtual prototyping of PoP interconnections regarding electrically activated mechanisms. / Meinshausen, L.; Weide-Zaage, K.; Frémont, H. et al.
    2010 11th International Conference on Thermal, Mechanical and Multi-Physics Simulation, and Experiments in Microelectronics and Microsystems, EuroSimE 2010. 2010. 5464618 (2010 11th International Conference on Thermal, Mechanical and Multi-Physics Simulation, and Experiments in Microelectronics and Microsystems, EuroSimE 2010).

    Publikation: Beitrag in Buch/Bericht/Sammelwerk/KonferenzbandAufsatz in KonferenzbandForschungPeer-Review

    Exemplified calculation of stress migration in a 90nm node via structure. / Weide-Zaage, Kirsten.
    2010 11th International Conference on Thermal, Mechanical and Multi-Physics Simulation, and Experiments in Microelectronics and Microsystems, EuroSimE 2010. 2010. 5464542 (2010 11th International Conference on Thermal, Mechanical and Multi-Physics Simulation, and Experiments in Microelectronics and Microsystems, EuroSimE 2010).

    Publikation: Beitrag in Buch/Bericht/Sammelwerk/KonferenzbandAufsatz in KonferenzbandForschungPeer-Review

    Influence of the activation energy of the different migration effects on failure locations in metallization. / Weide-Zaage, Kirsten; Ciptokusumo, Joharsyah; Aubel, Oliver.
    Stress-Induced Phenomena in Metallization - Eleventh International Workshop on Stress-Induced Phenomena in Metallization. 2010. S. 85-90 (AIP Conference Proceedings; Band 1300).

    Publikation: Beitrag in Buch/Bericht/Sammelwerk/KonferenzbandAufsatz in KonferenzbandForschungPeer-Review


    2009


    Investigation of stress distribution in via bottom of Cu-via structures with different via form by means of submodeling. / Ciptokusumo, Johar; Weide-Zaage, Kirsten; Aubel, Oliver.
    in: Microelectronics reliability, Jahrgang 49, Nr. 9-11, 09.2009, S. 1090-1095.

    Publikation: Beitrag in FachzeitschriftArtikelForschungPeer-Review

    Electrically driven matter transport effects in PoP interconnections. / Feng, W.; Weide-Zaage, K.; Verdier, F. et al.
    2009 10th International Conference on Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Microsystems, EuroSimE 2009. 2009. 4938457 (2009 10th International Conference on Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Microsystems, EuroSimE 2009).

    Publikation: Beitrag in Buch/Bericht/Sammelwerk/KonferenzbandAufsatz in KonferenzbandForschungPeer-Review


    2008


    Comprehensive reliability analysis of CoWP metal Cap unit processes for high volume production in sub-μm dimensions. / Aubel, O.; Thierbach, S.; Seidel, R. et al.
    46th Annual 2008 IEEE International Reliability Physics Symposium Proceedings, IRPS. 2008. S. 675-676 4558983 (IEEE International Reliability Physics Symposium Proceedings).

    Publikation: Beitrag in Buch/Bericht/Sammelwerk/KonferenzbandAufsatz in KonferenzbandForschungPeer-Review

    Determination of migration effects in Cu-via structures with respect to process-induced stress. / Weide-Zaage, Kirsten; Zhao, Jiani; Ciptokusumo, Joharsyah et al.
    in: Microelectronics reliability, Jahrgang 48, Nr. 8-9, 08.2008, S. 1393-1397.

    Publikation: Beitrag in FachzeitschriftArtikelForschungPeer-Review

    Simulation of migration effects in nanoscaled copper metallizations. / Weide-Zaage, Kirsten; Kashanchi, Farzan; Aubel, Oliver.
    in: Microelectronics reliability, Jahrgang 48, Nr. 8-9, 08.2008, S. 1398-1402.

    Publikation: Beitrag in FachzeitschriftArtikelForschungPeer-Review


  • Forschungsprojekte

    Systementwurf